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Author
5
Beltsios, K.
5
Bonafos, C.
5
Dimitrakis, P.
5
Kapetanakis, E.
5
Normand, P.
5
Soncini, V.
5
Tsoukalas, D.
4
Agarwal, A.
4
Ameen, M.
4
Benassayag, G.
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Subject
4
implantation
3
2-d arrays
3
ion beam synthesis
3
nanocrystals
2
ion implantation
2
nanocrystal memory
2
non-volatile memory
2
silicon implantation
2
silicon nanocrystals
2
thin sio2
.
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Item Type
5
journalArticle
Date
2
2004
3
2003
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ΑΠΟΘΕΤΗΡΙΟ "ΟΛΥΜΠΙΑΣ"
Σχολή Θετικών Επιστημών
Τμήμα Μηχανικών Επιστήμης Υλικών
Άρθρα σε επιστημονικά περιοδικά ( Ανοικτά)
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Effect of annealing environment on the memory properties of thin oxides with embedded Si nanocrystals obtained by low-energy ion-beam synthesis (Journal article)
Effects of annealing conditions on charge storage of Si nanocrystal memory devices obtained by low-energy ion beam synthesis (Journal article)
Processing issues in silicon nanocrystal manufacturing by ultra-low-energy ion-beam-synthesis for non-volatile memory applications (Journal article)
Nanocrystals manufacturing by ultra-low-energy ion-beam-synthesis for non-volatile memory applications (Journal article)
MOS memory structures by very-low-energy-implanted Si in thin SiO2 (Journal article)