Please use this identifier to cite or link to this item:
https://olympias.lib.uoi.gr/jspui/handle/123456789/14382| Title: | Processing issues in silicon nanocrystal manufacturing by ultra-low-energy ion-beam-synthesis for non-volatile memory applications |
| Institution and School/Department of submitter: | Πανεπιστήμιο Ιωαννίνων. Σχολή Θετικών Επιστημών. Τμήμα Μηχανικών Επιστήμης Υλικών |
| Keywords: | silicon nanocrystals,ion beam synthesis,silicon implantation,nanocrystal memory,non-volatile memory,2-d arrays,thin sio2,implantation |
| URI: | https://olympias.lib.uoi.gr/jspui/handle/123456789/14382 |
| ISSN: | 0167-9317 |
| Link: | <Go to ISI>://000222145400130 http://ac.els-cdn.com/S0167931704002114/1-s2.0-S0167931704002114-main.pdf?_tid=b02cfb0cdb7294528c827bbeefdec645&acdnat=1339662557_3510efc4338ffca481b86d7f374cdc84 |
| Publisher: | Elsevier |
| Appears in Collections: | Άρθρα σε επιστημονικά περιοδικά ( Ανοικτά) |
Files in This Item:
| File | Description | Size | Format | |
|---|---|---|---|---|
| Beltsios-2004-Processing issues in silicon.pdf | 271.41 kB | Adobe PDF | View/Open Request a copy |
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