Please use this identifier to cite or link to this item:
https://olympias.lib.uoi.gr/jspui/handle/123456789/14226| Title: | MOS memory structures by very-low-energy-implanted Si in thin SiO2 |
| Institution and School/Department of submitter: | Πανεπιστήμιο Ιωαννίνων. Σχολή Θετικών Επιστημών. Τμήμα Μηχανικών Επιστήμης Υλικών |
| Keywords: | si,nanocrystals,ion implantation,memory,single-electron |
| URI: | https://olympias.lib.uoi.gr/jspui/handle/123456789/14226 |
| ISSN: | 0921-5107 |
| Link: | <Go to ISI>://000184394900004 http://ac.els-cdn.com/S0921510702006888/1-s2.0-S0921510702006888-main.pdf?_tid=8765ad619c998cc718b6284c13cafac6&acdnat=1339662566_ec56a0046ca11f5d462133bee0c72dc3 |
| Publisher: | Elsevier |
| Appears in Collections: | Άρθρα σε επιστημονικά περιοδικά ( Ανοικτά) |
Files in This Item:
| File | Description | Size | Format | |
|---|---|---|---|---|
| Beltsios-2003-MOS memory structures.pdf | 262.85 kB | Adobe PDF | View/Open Request a copy |
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