Please use this identifier to cite or link to this item:
https://olympias.lib.uoi.gr/jspui/handle/123456789/15940| Title: | Investigation of deep implanted fluorine channeling profiles in silicon using resonant NRA |
| Institution and School/Department of submitter: | Πανεπιστήμιο Ιωαννίνων. Σχολή Επιστημών και Τεχνολογιών. Τμήμα Βιολογικών Εφαρμογών και Τεχνολογιών |
| Keywords: | high-energy implantation,channeling,nuclear resonance,fluorine profiling,resonant nra,c-trim,nuclear-reactions,ion-implantation,defect production,heavy-ions,damage |
| URI: | https://olympias.lib.uoi.gr/jspui/handle/123456789/15940 |
| ISSN: | 0168-583X |
| Link: | <Go to ISI>://000182039000011 http://ac.els-cdn.com/S0168583X03004488/1-s2.0-S0168583X03004488-main.pdf?_tid=fced648e240081e086af3966e751d0ed&acdnat=1334134424_a8adaed3a13e6093e0944c2e733180b5 |
| Appears in Collections: | Άρθρα σε επιστημονικά περιοδικά ( Ανοικτά) |
Files in This Item:
| File | Description | Size | Format | |
|---|---|---|---|---|
| Kokkoris-2003-Investigation of dee.pdf | 154.54 kB | Adobe PDF | View/Open Request a copy |
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