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Author
6
Beltsios, K.
2
Raptis, I.
2
Tegou, E.
2
Tortai, J. H.
2
Tserepi, A.
2
Vlachopoulou, M. E.
2
Vourdas, N.
1
Argitis, P.
1
Boudouvis, A. G.
1
Boulousis, G.
.
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Subject
3
lithography
2
ellipsometry
2
interferometry
2
pdms
1
amplification resists
1
chain packing
1
coefficient of thermal expansion
1
columnar structures
1
electron-beam lithography
1
functionalization of polymers
.
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Item Type
6
journalArticle
Date
5
2000 - 2010
1
1996 - 1999
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ΑΠΟΘΕΤΗΡΙΟ "ΟΛΥΜΠΙΑΣ"
Σχολή Θετικών Επιστημών
Τμήμα Μηχανικών Επιστήμης Υλικών
Άρθρα σε επιστημονικά περιοδικά ( Ανοικτά)
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Thickness-dependent glass transition temperature of thin resist films for high resolution lithography (Journal article)
Thermal and mechanical analysis of photoresist and silylated photoresist films: Application to AZ 5214(TM) (Journal article)
Effect of surface nanostructuring of PDMS on wetting properties, hydrophobic recovery and protein adsorption (Journal article)
Optimized Surface Silylation of Chemically Amplified Epoxidized Photoresists for Micromachining Applications (Journal article)
Multiwavelength interferometry and competing optical methods for the thermal probing of thin polymeric films (Journal article)
Nanostructuring of PDMS surfaces: Dependence on casting solvents (Journal article)