Please use this identifier to cite or link to this item:
https://olympias.lib.uoi.gr/jspui/handle/123456789/14316| Title: | Optimized Surface Silylation of Chemically Amplified Epoxidized Photoresists for Micromachining Applications |
| Institution and School/Department of submitter: | Πανεπιστήμιο Ιωαννίνων. Σχολή Θετικών Επιστημών. Τμήμα Μηχανικών Επιστήμης Υλικών |
| Keywords: | functionalization of polymers,microstructure,photoresists,selectivity,electron-beam lithography,amplification resists,novolac resist |
| URI: | https://olympias.lib.uoi.gr/jspui/handle/123456789/14316 |
| ISSN: | 0021-8995 |
| Link: | <Go to ISI>://000278886900041 http://onlinelibrary.wiley.com/store/10.1002/app.31644/asset/31644_ftp.pdf?v=1&t=h3fkch5l&s=a74231cb3a055288455a98a25c3b2fa57c1b3aff |
| Publisher: | Wiley |
| Appears in Collections: | Άρθρα σε επιστημονικά περιοδικά ( Ανοικτά) |
Files in This Item:
| File | Description | Size | Format | |
|---|---|---|---|---|
| Beltsios-2010-Optimized surface silylation.pdf | 849.19 kB | Adobe PDF | View/Open Request a copy |
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