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https://olympias.lib.uoi.gr/jspui/handle/123456789/14316Full metadata record
| DC Field | Value | Language |
|---|---|---|
| dc.contributor.author | Kontziampasis, D. | en |
| dc.contributor.author | Beltsios, K. | en |
| dc.contributor.author | Tegou, E. | en |
| dc.contributor.author | Argitis, P. | en |
| dc.contributor.author | Gogolides, E. | en |
| dc.date.accessioned | 2015-11-24T17:37:08Z | - |
| dc.date.available | 2015-11-24T17:37:08Z | - |
| dc.identifier.issn | 0021-8995 | - |
| dc.identifier.uri | https://olympias.lib.uoi.gr/jspui/handle/123456789/14316 | - |
| dc.rights | Default Licence | - |
| dc.subject | functionalization of polymers | en |
| dc.subject | microstructure | en |
| dc.subject | photoresists | en |
| dc.subject | selectivity | en |
| dc.subject | electron-beam lithography | en |
| dc.subject | amplification resists | en |
| dc.subject | novolac resist | en |
| dc.title | Optimized Surface Silylation of Chemically Amplified Epoxidized Photoresists for Micromachining Applications | en |
| heal.type | journalArticle | - |
| heal.type.en | Journal article | en |
| heal.type.el | Άρθρο Περιοδικού | el |
| heal.identifier.primary | Doi 10.1002/App.31644 | - |
| heal.identifier.secondary | <Go to ISI>://000278886900041 | - |
| heal.identifier.secondary | http://onlinelibrary.wiley.com/store/10.1002/app.31644/asset/31644_ftp.pdf?v=1&t=h3fkch5l&s=a74231cb3a055288455a98a25c3b2fa57c1b3aff | - |
| heal.language | en | - |
| heal.access | campus | - |
| heal.recordProvider | Πανεπιστήμιο Ιωαννίνων. Σχολή Θετικών Επιστημών. Τμήμα Μηχανικών Επιστήμης Υλικών | el |
| heal.publicationDate | 2010 | - |
| heal.abstract | We explored the selective wet silylation of noncrosslinked areas of epoxidized photoresists using chlorosilanes. Emphasis was placed on the Si uptake of the epoxy films when controlled low levels of water were incorporated into the silylation solution. Fourier transform infrared measurements and oxygen-plasma resistance data with in situ laser interferometry and multiwavelength ellipsometry are presented. The fine tuning of the moisture level was found to be crucial for the generation of satisfactory and reproducible structures. The optimized version of the process was shown to be useful for epoxy-based dry micromachining. Overall, an attractive positive-tone process is presented as an alternative to the usual negative-tone process for commercial epoxy resists. (C) 2010 Wiley Periodicals, Inc. J Appl Polym Sci 117: 2189-2195, 2010 | en |
| heal.publisher | Wiley | en |
| heal.journalName | Journal of Applied Polymer Science | en |
| heal.journalType | peer reviewed | - |
| heal.fullTextAvailability | TRUE | - |
| Appears in Collections: | Άρθρα σε επιστημονικά περιοδικά ( Ανοικτά) | |
Files in This Item:
| File | Description | Size | Format | |
|---|---|---|---|---|
| Beltsios-2010-Optimized surface silylation.pdf | 849.19 kB | Adobe PDF | View/Open Request a copy |
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