Please use this identifier to cite or link to this item: https://olympias.lib.uoi.gr/jspui/handle/123456789/16412
Title: Current Transport Mechanism in High-kappa Cerium Oxide Gate Dielectrics Grown on Germanium Substrates
Institution and School/Department of submitter: Πανεπιστήμιο Ιωαννίνων. Σχολή Επιστημών και Τεχνολογιών. Τμήμα Βιολογικών Εφαρμογών και Τεχνολογιών
Keywords: cerium compounds,germanium,high-k dielectric thin films,mis devices,mis structures,platinum,poole-frenkel effect,schottky barriers,devices,films
URI: https://olympias.lib.uoi.gr/jspui/handle/123456789/16412
ISSN: 1099-0062
Link: <Go to ISI>://000264283100022
http://scitation.aip.org/getabs/servlet/GetabsServlet?prog=normal&id=ESLEF600001200000500H165000001&idtype=cvips&gifs=yes&ref=no
Appears in Collections:Άρθρα σε επιστημονικά περιοδικά ( Ανοικτά)

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