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dc.contributor.authorPapachristodoulou, C.en
dc.contributor.authorPatiris, D.en
dc.contributor.authorIoannides, K. G.en
dc.date.accessioned2015-11-24T18:30:31Z-
dc.date.available2015-11-24T18:30:31Z-
dc.identifier.issn0168-583X-
dc.identifier.urihttps://olympias.lib.uoi.gr/jspui/handle/123456789/16377-
dc.rightsDefault Licence-
dc.subjectedxrfen
dc.subjectmass absorption coefficienten
dc.subjectdetector thicknessen
dc.subjectcr-39en
dc.subjectbulk etch rateen
dc.subjectmass-change methoden
dc.subjectatomic-force microscopeen
dc.subjectepoxy-resinen
dc.subjectspectrometryen
dc.subjectthicknessesen
dc.subjecttemperatureen
dc.subjecttechnologyen
dc.subjectscienceen
dc.subjectstateen
dc.titleDetermination of bulk etch rate for CR-39 nuclear track detectors using an X-ray fluorescence methoden
heal.typejournalArticle-
heal.type.enJournal articleen
heal.type.elΆρθρο Περιοδικούel
heal.identifier.primaryDOI 10.1016/j.nimb.2007.08.005-
heal.identifier.secondary<Go to ISI>://000251737300025-
heal.identifier.secondaryhttp://ac.els-cdn.com/S0168583X07013559/1-s2.0-S0168583X07013559-main.pdf?_tid=7f16534b7b881b7248846ef73285f707&acdnat=1334223178_7ba0183b89af245437a27175166016b6-
heal.languageen-
heal.accesscampus-
heal.recordProviderΠανεπιστήμιο Ιωαννίνων. Σχολή Επιστημών και Τεχνολογιών. Τμήμα Βιολογικών Εφαρμογών και Τεχνολογιώνel
heal.publicationDate2007-
heal.abstractThe thickness of a CR-39 detector is determined using an energy dispersive X-ray fluorescence (EDXRF) method of analysis. The method is based on exciting a suitable target and measuring the intensity of its fluorescence X-ray lines passing through the CR-39 sample in a fixed geometry. By properly selecting the target material, the method succeeds in assessing the thickness change of CR-39 detectors etched for different time intervals. The bulk etch rate (V-b) may thus be obtained, which is an important parameter for any solid state nuclear track detector. Application of the EDXRF method yielded a value of V-b = (2.01 +/- 0.04) mu m h(-1) for etching in a 6 N NaOH solution at 75 degrees C. This value agrees with the bulk etch rate of (1.90 +/- 0.03) mu m h(-1), obtained by the conventional mass-change method. (C) 2007 Elsevier B.V. All rights reserved.en
heal.journalNameNuclear Instruments & Methods in Physics Research Section B-Beam Interactions with Materials and Atomsen
heal.journalTypepeer reviewed-
heal.fullTextAvailabilityTRUE-
Appears in Collections:Άρθρα σε επιστημονικά περιοδικά ( Ανοικτά)

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