Please use this identifier to cite or link to this item:
https://olympias.lib.uoi.gr/jspui/handle/123456789/14512| Title: | Stress evolution in magnetron sputtered Ti-Zr-N and Ti-Ta-N films studied by in situ wafer curvature: Role of energetic particles |
| Institution and School/Department of submitter: | Πανεπιστήμιο Ιωαννίνων. Σχολή Θετικών Επιστημών. Τμήμα Μηχανικών Επιστήμης Υλικών |
| Keywords: | stress,gradients,in situ,magnetron sputtering,ternary nitride,tin,zrn,tan,deposited thin-films,preferred orientation,nitride films,growth,coatings,gradients,thickness,systems |
| URI: | https://olympias.lib.uoi.gr/jspui/handle/123456789/14512 |
| ISSN: | 0040-6090 |
| Link: | <Go to ISI>://000272861500038 http://ac.els-cdn.com/S0040609009013340/1-s2.0-S0040609009013340-main.pdf?_tid=712e111480b439ebdba4b13d4eaf5e72&acdnat=1339755600_13c13dae600e8a42809a573bf303473f |
| Publisher: | Elsevier |
| Appears in Collections: | Άρθρα σε επιστημονικά περιοδικά ( Ανοικτά) |
Files in This Item:
| File | Description | Size | Format | |
|---|---|---|---|---|
| Abadias-2009-Stress evolution in.pdf | 456.52 kB | Adobe PDF | View/Open Request a copy |
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