Please use this identifier to cite or link to this item:
https://olympias.lib.uoi.gr/jspui/handle/123456789/14429| Title: | Robust Block Copolymer Mask for Nanopatterning Polymer Films |
| Institution and School/Department of submitter: | Πανεπιστήμιο Ιωαννίνων. Σχολή Θετικών Επιστημών. Τμήμα Μηχανικών Επιστήμης Υλικών |
| Keywords: | assembly,thin films,nanostructures,porous materials,polymeric materials,thin-films,diblock copolymer,lithography,polystyrene,arrays,orientation,templates,polydimethylsiloxane,nanolithography,nanostructures |
| URI: | https://olympias.lib.uoi.gr/jspui/handle/123456789/14429 |
| ISSN: | 1936-0851 |
| Link: | <Go to ISI>://000276956800041 http://pubs.acs.org/doi/abs/10.1021/nn901370g |
| Publisher: | American Chemical Society |
| Appears in Collections: | Άρθρα σε επιστημονικά περιοδικά ( Ανοικτά) |
Files in This Item:
There are no files associated with this item.
This item is licensed under a Creative Commons License
