Please use this identifier to cite or link to this item:
https://olympias.lib.uoi.gr/jspui/handle/123456789/14340| Title: | Plasma energy and work function of conducting transition metal nitrides for electronic applications |
| Institution and School/Department of submitter: | Πανεπιστήμιο Ιωαννίνων. Σχολή Θετικών Επιστημών. Τμήμα Μηχανικών Επιστήμης Υλικών |
| Keywords: | electrical conductivity,lattice constants,metallurgy,semiconductor thin films,solid-state plasma,stoichiometry,work function,thin-films,microstructure,metallization,contacts |
| URI: | https://olympias.lib.uoi.gr/jspui/handle/123456789/14340 |
| ISSN: | 0003-6951 |
| Link: | <Go to ISI>://000265285200042 |
| Publisher: | American Institute of Physics |
| Appears in Collections: | Άρθρα σε επιστημονικά περιοδικά ( Ανοικτά) |
Files in This Item:
| File | Description | Size | Format | |
|---|---|---|---|---|
| Patsalas-2009-Pla.pdf | 788.85 kB | Adobe PDF | View/Open |
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