Please use this identifier to cite or link to this item:
https://olympias.lib.uoi.gr/jspui/handle/123456789/13947| Title: | A new masking method for protecting silicon surfaces during anisotropic silicon wet etching |
| Institution and School/Department of submitter: | Πανεπιστήμιο Ιωαννίνων. Σχολή Θετικών Επιστημών. Τμήμα Μηχανικών Επιστήμης Υλικών |
| Keywords: | silicon etching,fluorocarbon film,masking,fluorocarbon plasma,silicon micromachining,mesa patterning |
| URI: | https://olympias.lib.uoi.gr/jspui/handle/123456789/13947 |
| ISSN: | 0167-9317 |
| Link: | <Go to ISI>://000176594700122 |
| Publisher: | Elsevier |
| Appears in Collections: | Άρθρα σε επιστημονικά περιοδικά ( Ανοικτά) |
Files in This Item:
| File | Description | Size | Format | |
|---|---|---|---|---|
| Beltsios-2002-A new masking method.pdf | 657.55 kB | Adobe PDF | View/Open Request a copy |
This item is licensed under a Creative Commons License
