Please use this identifier to cite or link to this item: https://olympias.lib.uoi.gr/jspui/handle/123456789/13947
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dc.contributor.authorNormand, P.en
dc.contributor.authorBeltsios, K.en
dc.contributor.authorTserepi, A.en
dc.contributor.authorAidinis, K.en
dc.contributor.authorTsoukalas, D.en
dc.contributor.authorCardinaud, C.en
dc.date.accessioned2015-11-24T17:34:18Z-
dc.date.available2015-11-24T17:34:18Z-
dc.identifier.issn0167-9317-
dc.identifier.urihttps://olympias.lib.uoi.gr/jspui/handle/123456789/13947-
dc.rightsDefault Licence-
dc.subjectsilicon etchingen
dc.subjectfluorocarbon filmen
dc.subjectmaskingen
dc.subjectfluorocarbon plasmaen
dc.subjectsilicon micromachiningen
dc.subjectmesa patterningen
dc.titleA new masking method for protecting silicon surfaces during anisotropic silicon wet etchingen
heal.typejournalArticle-
heal.type.enJournal articleen
heal.type.elΆρθρο Περιοδικούel
heal.identifier.secondary<Go to ISI>://000176594700122-
heal.languageen-
heal.accesscampus-
heal.recordProviderΠανεπιστήμιο Ιωαννίνων. Σχολή Θετικών Επιστημών. Τμήμα Μηχανικών Επιστήμης Υλικώνel
heal.publicationDate2002-
heal.abstractA room-temperature silicon masking approach based on the exposure of silicon to CHF3-based plasma is explored. This plasma treatment leads to ultra-thin (2-5 nm) films that consist of a fluorocarbon top layer and a sub-oxide lower layer and are appropriate for anisotropic wet etching masks. The mask resistance to anisotropic wet-etchants is studied as a function of film preparation parameters. Defect evolution is examined for two key film preparation conditions. Masks explored compare favourably with common masking materials such as SiO2 or Si3N4 in terms of achievable patterns and processing options compatible with standard silicon integrated circuit technology. In addition, the new masking method can be applied when sidewall-only wet etching of mesa patterns is desired. (C) 2002 Elsevier Science B.V. All rights reserved.en
heal.publisherElsevieren
heal.journalNameMicroelectronic Engineeringen
heal.journalTypepeer reviewed-
heal.fullTextAvailabilityTRUE-
Appears in Collections:Άρθρα σε επιστημονικά περιοδικά ( Ανοικτά)

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