Please use this identifier to cite or link to this item:
https://olympias.lib.uoi.gr/jspui/handle/123456789/13803| Title: | A masking approach for anisotropic silicon wet etching |
| Institution and School/Department of submitter: | Πανεπιστήμιο Ιωαννίνων. Σχολή Θετικών Επιστημών. Τμήμα Μηχανικών Επιστήμης Υλικών |
| Keywords: | fabrication,surfaces,damage |
| URI: | https://olympias.lib.uoi.gr/jspui/handle/123456789/13803 |
| ISSN: | 1099-0062 |
| Link: | <Go to ISI>://000170903900014 |
| Publisher: | Electrochemical Society |
| Appears in Collections: | Άρθρα σε επιστημονικά περιοδικά ( Ανοικτά) |
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