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| DC Field | Value | Language |
|---|---|---|
| dc.contributor.author | Normand, P. | en |
| dc.contributor.author | Beltsios, K. | en |
| dc.contributor.author | Tserepi, A. | en |
| dc.contributor.author | Aidinis, K. | en |
| dc.contributor.author | Tsoukalas, A. | en |
| dc.contributor.author | Cardinaud, C. | en |
| dc.date.accessioned | 2015-11-24T17:32:58Z | - |
| dc.date.available | 2015-11-24T17:32:58Z | - |
| dc.identifier.issn | 1099-0062 | - |
| dc.identifier.uri | https://olympias.lib.uoi.gr/jspui/handle/123456789/13803 | - |
| dc.rights | Default Licence | - |
| dc.subject | fabrication | en |
| dc.subject | surfaces | en |
| dc.subject | damage | en |
| dc.title | A masking approach for anisotropic silicon wet etching | en |
| heal.type | journalArticle | - |
| heal.type.en | Journal article | en |
| heal.type.el | Άρθρο Περιοδικού | el |
| heal.identifier.secondary | <Go to ISI>://000170903900014 | - |
| heal.language | en | - |
| heal.access | campus | - |
| heal.recordProvider | Πανεπιστήμιο Ιωαννίνων. Σχολή Θετικών Επιστημών. Τμήμα Μηχανικών Επιστήμης Υλικών | el |
| heal.publicationDate | 2001 | - |
| heal.abstract | A new simple and rapid room-temperature silicon masking approach based on the exposure of silicon to CHF3-based plasma is presented. This plasma treatment leads to silicon surface modifications appropriate for masking purposes during anisotropic etching in ethylenediamine-pyrocatechol-water (EPW) solutions. The resistance of the mask to EPW etching solutions is studied as a function of plasma radio frequency power and pressure, plasma duration, silicon surface preparation, and aging. Mask resistance increases with increasing power density and decreasing pressure. Plasma duration has a significant effect on the temporal and spatial pattern of defects that evolve during etching and lead eventually to mask destruction. (C) 2001 The Electrochemical Society. | en |
| heal.publisher | Electrochemical Society | en |
| heal.journalName | Electrochemical and Solid State Letters | en |
| heal.journalType | peer reviewed | - |
| heal.fullTextAvailability | TRUE | - |
| Appears in Collections: | Άρθρα σε επιστημονικά περιοδικά ( Ανοικτά) | |
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