Please use this identifier to cite or link to this item:
https://olympias.lib.uoi.gr/jspui/handle/123456789/13569| Title: | The kinetics of sputtered deposited carbon on silicon: a phenomenological model |
| Institution and School/Department of submitter: | Πανεπιστήμιο Ιωαννίνων. Σχολή Θετικών Επιστημών. Τμήμα Μηχανικών Επιστήμης Υλικών |
| Keywords: | amorphous carbon,deposition,modeling,ellipsometry,a-c-h,thin-films,optical-properties,diamond,stress |
| URI: | https://olympias.lib.uoi.gr/jspui/handle/123456789/13569 |
| ISSN: | 0925-9635 |
| Link: | <Go to ISI>://000080437000073 |
| Publisher: | Elsevier |
| Appears in Collections: | Άρθρα σε επιστημονικά περιοδικά ( Ανοικτά) |
Files in This Item:
| File | Description | Size | Format | |
|---|---|---|---|---|
| Patsalas-1999-The kinetics of sputtered.pdf | 149.46 kB | Adobe PDF | View/Open Request a copy |
This item is licensed under a Creative Commons License
