Please use this identifier to cite or link to this item:
https://olympias.lib.uoi.gr/jspui/handle/123456789/13539
Title: | The effect of postgrowth ion irradiation on the microstructure and the interface properties of amorphous carbon films on silicon |
Institution and School/Department of submitter: | Πανεπιστήμιο Ιωαννίνων. Σχολή Θετικών Επιστημών. Τμήμα Μηχανικών Επιστήμης Υλικών |
Keywords: | thin-films,deposition mechanism,beam bombardment,diamond,crystallization,nucleation,dependence,phase,transformation,breakdown |
URI: | https://olympias.lib.uoi.gr/jspui/handle/123456789/13539 |
ISSN: | 0021-8979 |
Link: | <Go to ISI>://000165543200028 |
Publisher: | American Institute of Physics |
Appears in Collections: | Άρθρα σε επιστημονικά περιοδικά ( Ανοικτά) |
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File | Description | Size | Format | |
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Patsalas-2000-The ef.pdf | 484.66 kB | Adobe PDF | View/Open Request a copy |
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