Please use this identifier to cite or link to this item: https://olympias.lib.uoi.gr/jspui/handle/123456789/14563
Full metadata record
DC FieldValueLanguage
dc.contributor.authorPatsalas, P.en
dc.contributor.authorGravalidis, C.en
dc.contributor.authorLogothetidis, S.en
dc.date.accessioned2015-11-24T17:38:52Z-
dc.date.available2015-11-24T17:38:52Z-
dc.identifier.issn0021-8979-
dc.identifier.urihttps://olympias.lib.uoi.gr/jspui/handle/123456789/14563-
dc.rightsDefault Licence-
dc.subjectchemical-vapor-depositionen
dc.subjectx-ray-diffractionen
dc.subjectweber thin-filmsen
dc.subjecttin filmsen
dc.subjectresidual-stressen
dc.subjectoptical-propertiesen
dc.subjectinitial growthen
dc.subjectsilicon filmsen
dc.subjectreal-timeen
dc.subjectmicrostructureen
dc.titleSurface kinetics and subplantation phenomena affecting the texture, morphology, stress, and growth evolution of titanium nitride filmsen
heal.typejournalArticle-
heal.type.enJournal articleen
heal.type.elΆρθρο Περιοδικούel
heal.identifier.primaryDoi 10.1063/1.1811389-
heal.identifier.secondary<Go to ISI>://000225300800043-
heal.languageen-
heal.accesscampus-
heal.recordProviderΠανεπιστήμιο Ιωαννίνων. Σχολή Θετικών Επιστημών. Τμήμα Μηχανικών Επιστήμης Υλικώνel
heal.publicationDate2004-
heal.abstractWe present a thorough study of the microstructure, texture, intrinsic stress, surface, and interface morphology of transition metal nitride (mainly TiN but also CrN) films grown on Si by reactive sputter deposition, with emphasis to the mechanisms of adatom migration on the surface and subplantation of energetic species. In order to study the effects of adatom mobility and the subplantation probability we vary the ion energy and growth temperature. For the experimental part of this work we used nondestructive, statistically reliable x-ray techniques (diffraction, reflectivity, scattering). The x-ray results are compared and correlated with supporting data of in situ spectroscopic ellipsometry as well as Monte Carlo simulations of the irradiation effects and surface diffusion of adatoms. We found that the texture and the surface and interface morphology are sensitive to the mechanism of dissipation of the impinging ions. If the energy is enough to overcome the subplantation threshold (similar to50 eV), then the films are highly compressed and exhibit ultrasmooth surfaces and rough interfaces. In this case, the texture of the films is not affected much by the ion energy, since the energy is dissipated in the bulk and contributes less to the surface mobility of adatoms. On the other hand, when the ion energy is below the subplantation threshold the texture of the films strongly depends on the ion energy and flux, the interfaces are atomically sharp and the surface morphology depends on the mobility and surface diffusion length of adatoms. However, in both cases these effects are dominant at the homogeneous growth. At the initial stages of nucleation and island growth the differences in the growth due to irradiation conditions are not pronounced and the thermodynamics of wetting of TiN on Si are prevailing factors. (C) 2004 American Institute of Physics.en
heal.publisherAmerican Institute of Physicsen
heal.journalNameJournal of Applied Physicsen
heal.journalTypepeer reviewed-
heal.fullTextAvailabilityTRUE-
Appears in Collections:Άρθρα σε επιστημονικά περιοδικά ( Ανοικτά)

Files in This Item:
File Description SizeFormat 
Patsalas-2004-Sur.pdf478.87 kBAdobe PDFView/Open    Request a copy


This item is licensed under a Creative Commons License Creative Commons