Please use this identifier to cite or link to this item:
https://olympias.lib.uoi.gr/jspui/handle/123456789/14077| Title: | Insights on the deposition mechanism of sputtered amorphous carbon films |
| Institution and School/Department of submitter: | Πανεπιστήμιο Ιωαννίνων. Σχολή Θετικών Επιστημών. Τμήμα Μηχανικών Επιστήμης Υλικών |
| Keywords: | amorphous carbon,plasma sputtering,elastic properties,microstructure,stress-induced formation,a-c-h,thin-films,approaching diamond,compressive-stress,optical-properties,ion energy,density,model |
| URI: | https://olympias.lib.uoi.gr/jspui/handle/123456789/14077 |
| ISSN: | 0008-6223 |
| Link: | <Go to ISI>://000080216000010 |
| Publisher: | Pergamon-Elsevier |
| Appears in Collections: | Άρθρα σε επιστημονικά περιοδικά ( Ανοικτά) |
Files in This Item:
| File | Description | Size | Format | |
|---|---|---|---|---|
| Patsalas-1999-Insights on the deposition mechanism.pdf | 107.71 kB | Adobe PDF | View/Open Request a copy |
This item is licensed under a Creative Commons License
