Please use this identifier to cite or link to this item:
https://olympias.lib.uoi.gr/jspui/handle/123456789/14077
Full metadata record
DC Field | Value | Language |
---|---|---|
dc.contributor.author | Logothetids, S. | en |
dc.contributor.author | Gioti, M. | en |
dc.contributor.author | Patsalas, P. | en |
dc.contributor.author | Charitidis, C. | en |
dc.date.accessioned | 2015-11-24T17:35:07Z | - |
dc.date.available | 2015-11-24T17:35:07Z | - |
dc.identifier.issn | 0008-6223 | - |
dc.identifier.uri | https://olympias.lib.uoi.gr/jspui/handle/123456789/14077 | - |
dc.rights | Default Licence | - |
dc.subject | amorphous carbon | en |
dc.subject | plasma sputtering | en |
dc.subject | elastic properties | en |
dc.subject | microstructure | en |
dc.subject | stress-induced formation | en |
dc.subject | a-c-h | en |
dc.subject | thin-films | en |
dc.subject | approaching diamond | en |
dc.subject | compressive-stress | en |
dc.subject | optical-properties | en |
dc.subject | ion energy | en |
dc.subject | density | en |
dc.subject | model | en |
dc.title | Insights on the deposition mechanism of sputtered amorphous carbon films | en |
heal.type | journalArticle | - |
heal.type.en | Journal article | en |
heal.type.el | Άρθρο Περιοδικού | el |
heal.identifier.primary | Doi 10.1016/S0008-6223(98)00268-1 | - |
heal.identifier.secondary | <Go to ISI>://000080216000010 | - |
heal.language | en | - |
heal.access | campus | - |
heal.recordProvider | Πανεπιστήμιο Ιωαννίνων. Σχολή Θετικών Επιστημών. Τμήμα Μηχανικών Επιστήμης Υλικών | el |
heal.publicationDate | 1999 | - |
heal.abstract | Low energy Ar+ ion bombardment (LEIB) during growth of amorphous carbon (a-C) films deposited with magnetron sputtering (MS), results to dense films, rich in sp(3) C-C bonds, and exhibit high hardness and compressive stress. We present here a preliminary study of the growth mechanism of a-C films deposited with negative bias voltage (LEIB) in terms of their composition, density and mechanical properties. The experimental results showed that stress and hardness are directly related with the sp(3) C-C bonding in the film and described well with the so far proposed models on the formation mechanism of tetrahedral carbon. However, the film density, that is a composite property, was found to depend not only on the sp(2) and sp(3) content but also on a new, denser than graphite, carbon phase when the Ar+ ion energy is above similar to 130 eV. (C) 1999 Elsevier Science Ltd. All rights reserved. | en |
heal.publisher | Pergamon-Elsevier | en |
heal.journalName | Carbon | en |
heal.journalType | peer reviewed | - |
heal.fullTextAvailability | TRUE | - |
Appears in Collections: | Άρθρα σε επιστημονικά περιοδικά ( Ανοικτά) |
Files in This Item:
File | Description | Size | Format | |
---|---|---|---|---|
Patsalas-1999-Insights on the deposition mechanism.pdf | 107.71 kB | Adobe PDF | View/Open Request a copy |
This item is licensed under a Creative Commons License