Please use this identifier to cite or link to this item:
https://olympias.lib.uoi.gr/jspui/handle/123456789/13969| Title: | A new process for the development of hard and stable sputtered amorphous carbon films |
| Institution and School/Department of submitter: | Πανεπιστήμιο Ιωαννίνων. Σχολή Θετικών Επιστημών. Τμήμα Μηχανικών Επιστήμης Υλικών |
| Keywords: | amorphous carbon films,ellipsometry,sputtering,stress,x-ray reflectivity,spectroscopic ellipsometry,diamond |
| URI: | https://olympias.lib.uoi.gr/jspui/handle/123456789/13969 |
| ISSN: | 0042-207X |
| Link: | <Go to ISI>://000079470600015 |
| Publisher: | Pergamon-Elsevier |
| Appears in Collections: | Άρθρα σε επιστημονικά περιοδικά ( Ανοικτά) |
Files in This Item:
| File | Description | Size | Format | |
|---|---|---|---|---|
| Patsalas-1999-A new process for.pdf | 176.21 kB | Adobe PDF | View/Open Request a copy |
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