Please use this identifier to cite or link to this item: https://olympias.lib.uoi.gr/jspui/handle/123456789/13965
Title: Flow Phenomena in Chemical Vapor-Deposition of Thin-Films
Institution and School/Department of submitter: Πανεπιστήμιο Ιωαννίνων. Σχολή Θετικών Επιστημών. Τμήμα Μηχανικών Επιστήμης Υλικών
Keywords: mixed convection,double-diffusive phenomena,thermal and solutal convection,finite-element flow simulations,materials processing,horizontal mocvd reactors,monte-carlo simulation,growth-rate uniformity,rotating-disk,transport phenomena,mass-transfer,gas-phase,directional solidification,thermal-convection,mathematical-model
URI: https://olympias.lib.uoi.gr/jspui/handle/123456789/13965
ISSN: 0066-4189
Link: <Go to ISI>://A1991ET75000009
Appears in Collections:Άρθρα σε επιστημονικά περιοδικά ( Ανοικτά)

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