Please use this identifier to cite or link to this item: https://olympias.lib.uoi.gr/jspui/handle/123456789/13834
Institution and School/Department of submitter: Πανεπιστήμιο Ιωαννίνων. Σχολή Θετικών Επιστημών. Τμήμα Μηχανικών Επιστήμης Υλικών
Keywords: dielectric properties,electronic transitions,cerium oxide films,pulsed-laser deposition,ceo2 thin-films,optical-properties,epitaxial-growth,silicon,si(111),layers,temperature
URI: https://olympias.lib.uoi.gr/jspui/handle/123456789/13834
ISSN: 0921-5107
Link: <Go to ISI>://000221657000016
http://ac.els-cdn.com/S0921510703005452/1-s2.0-S0921510703005452-main.pdf?_tid=46a40f87f1025c24ca1fc0d50d56470b&acdnat=1339755796_ee7fc322193f30ba1f5664c0502fef0d
Publisher: Elsevier
Appears in Collections:Άρθρα σε επιστημονικά περιοδικά ( Ανοικτά)

Files in This Item:
File Description SizeFormat 
Logothetidis-2004-Dielectric propertie.pdf333.71 kBAdobe PDFView/Open    Request a copy


This item is licensed under a Creative Commons License Creative Commons