Please use this identifier to cite or link to this item:
https://olympias.lib.uoi.gr/jspui/handle/123456789/13739| Title: | Characterization of magnetron sputtering deposited thin films of TiN for use as a metal electrode on TiN/SiO2/Si metal-oxide-semiconductor devices |
| Institution and School/Department of submitter: | Πανεπιστήμιο Ιωαννίνων. Σχολή Θετικών Επιστημών. Τμήμα Μηχανικών Επιστήμης Υλικών |
| Keywords: | titanium nitride |
| URI: | https://olympias.lib.uoi.gr/jspui/handle/123456789/13739 |
| ISSN: | 0021-8979 |
| Link: | <Go to ISI>://000165543900036 http://link.aip.org/getpdf/servlet/GetPDFServlet?filetype=pdf&id=JAPIAU000088000012007192000001 |
| Publisher: | American Institute of Physics |
| Appears in Collections: | Άρθρα σε επιστημονικά περιοδικά ( Ανοικτά) |
Files in This Item:
| File | Description | Size | Format | |
|---|---|---|---|---|
| Evangelou-2000-Characterization of.pdf | 310.9 kB | Adobe PDF | View/Open Request a copy |
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