Please use this identifier to cite or link to this item: https://olympias.lib.uoi.gr/jspui/handle/123456789/10704
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dc.contributor.authorKamoulakos, G.en
dc.contributor.authorHaniotakis, T.en
dc.contributor.authorTsiatouhas, Y.en
dc.contributor.authorSchoellkopf, J. P.en
dc.contributor.authorArapoyanni, A.en
dc.date.accessioned2015-11-24T17:00:05Z-
dc.date.available2015-11-24T17:00:05Z-
dc.identifier.issn0026-2692-
dc.identifier.urihttps://olympias.lib.uoi.gr/jspui/handle/123456789/10704-
dc.rightsDefault Licence-
dc.subjecttrench isolationen
dc.subjectdrift mosfeten
dc.subjecthigh voltage deviceen
dc.subjectdevice simulationen
dc.titleDevice simulation of a n-DMOS cell with trench isolationen
heal.typejournalArticle-
heal.type.enJournal articleen
heal.type.elΆρθρο Περιοδικούel
heal.languageen-
heal.accesscampus-
heal.recordProviderΠανεπιστήμιο Ιωαννίνων. Σχολή Θετικών Επιστημών. Τμήμα Μηχανικών Ηλεκτρονικών Υπολογιστών και Πληροφορικήςel
heal.publicationDate2001-
heal.abstractThe DMOS cell, a high-voltage transistor, implemented in low voltage standard 0.18 mum double-well CMOS technology with trench isolation is studied. The operation of the cell is investigated with the use of a device simulator while the effect of the trench to the operation of the cell is revealed. (C) 2000 Elsevier Science Ltd. All rights reserved.en
heal.journalNameMicroelectronics Journalen
heal.journalTypepeer reviewed-
heal.fullTextAvailabilityTRUE-
Appears in Collections:Άρθρα σε επιστημονικά περιοδικά ( Ανοικτά)

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