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DC Field | Value | Language |
---|---|---|
dc.contributor.author | Kamoulakos, G. | en |
dc.contributor.author | Haniotakis, T. | en |
dc.contributor.author | Tsiatouhas, Y. | en |
dc.contributor.author | Schoellkopf, J. P. | en |
dc.contributor.author | Arapoyanni, A. | en |
dc.date.accessioned | 2015-11-24T17:00:05Z | - |
dc.date.available | 2015-11-24T17:00:05Z | - |
dc.identifier.issn | 0026-2692 | - |
dc.identifier.uri | https://olympias.lib.uoi.gr/jspui/handle/123456789/10704 | - |
dc.rights | Default Licence | - |
dc.subject | trench isolation | en |
dc.subject | drift mosfet | en |
dc.subject | high voltage device | en |
dc.subject | device simulation | en |
dc.title | Device simulation of a n-DMOS cell with trench isolation | en |
heal.type | journalArticle | - |
heal.type.en | Journal article | en |
heal.type.el | Άρθρο Περιοδικού | el |
heal.language | en | - |
heal.access | campus | - |
heal.recordProvider | Πανεπιστήμιο Ιωαννίνων. Σχολή Θετικών Επιστημών. Τμήμα Μηχανικών Ηλεκτρονικών Υπολογιστών και Πληροφορικής | el |
heal.publicationDate | 2001 | - |
heal.abstract | The DMOS cell, a high-voltage transistor, implemented in low voltage standard 0.18 mum double-well CMOS technology with trench isolation is studied. The operation of the cell is investigated with the use of a device simulator while the effect of the trench to the operation of the cell is revealed. (C) 2000 Elsevier Science Ltd. All rights reserved. | en |
heal.journalName | Microelectronics Journal | en |
heal.journalType | peer reviewed | - |
heal.fullTextAvailability | TRUE | - |
Appears in Collections: | Άρθρα σε επιστημονικά περιοδικά ( Ανοικτά) |
Files in This Item:
File | Description | Size | Format | |
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tsiatouhas-2001-Device simulation of a n-DMOS cell with trench isolation.pdf | 863.52 kB | Adobe PDF | View/Open Request a copy |
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