Please use this identifier to cite or link to this item:
https://olympias.lib.uoi.gr/jspui/handle/123456789/14454Full metadata record
| DC Field | Value | Language |
|---|---|---|
| dc.contributor.author | Kitsara, M. | en |
| dc.contributor.author | Beltsios, K. | en |
| dc.contributor.author | Goustouridis, D. | en |
| dc.contributor.author | Chatzandroulis, S. | en |
| dc.contributor.author | Raptis, L. | en |
| dc.date.accessioned | 2015-11-24T17:38:10Z | - |
| dc.date.available | 2015-11-24T17:38:10Z | - |
| dc.identifier.issn | 0014-3057 | - |
| dc.identifier.uri | https://olympias.lib.uoi.gr/jspui/handle/123456789/14454 | - |
| dc.rights | Default Licence | - |
| dc.subject | polymer deposition | en |
| dc.subject | photolithography | en |
| dc.subject | chemical sensors | en |
| dc.subject | vapor sorption | en |
| dc.subject | polymer swelling | en |
| dc.subject | white-light interferometry | en |
| dc.subject | volatile organic-compounds | en |
| dc.subject | electron-beam | en |
| dc.subject | water-vapor | en |
| dc.subject | films | en |
| dc.subject | methacrylate) | en |
| dc.subject | sorption | en |
| dc.subject | resist | en |
| dc.subject | microsensors | en |
| dc.subject | performance | en |
| dc.title | Sequential polymer lithography for chemical sensor arrays | en |
| heal.type | journalArticle | - |
| heal.type.en | Journal article | en |
| heal.type.el | Άρθρο Περιοδικού | el |
| heal.identifier.primary | DOI 10.1016/j.eurpolymj.2007.07.034 | - |
| heal.identifier.secondary | <Go to ISI>://000251625700003 | - |
| heal.identifier.secondary | http://ac.els-cdn.com/S0014305707004454/1-s2.0-S0014305707004454-main.pdf?_tid=cf68bf189fdb71e901bf7c6a45644ff2&acdnat=1339662528_15af258000b830796a8e97ebff9ab490 | - |
| heal.language | en | - |
| heal.access | campus | - |
| heal.recordProvider | Πανεπιστήμιο Ιωαννίνων. Σχολή Θετικών Επιστημών. Τμήμα Μηχανικών Επιστήμης Υλικών | el |
| heal.publicationDate | 2007 | - |
| heal.abstract | A simple process for the deposition of up to six different polymers in selected areas to be used as sensitive layers in chemical sensor arrays is presented. The process is based on photolithographic processes and takes advantage of the balance between UV exposure dose, material tone and developers used. The sensing properties of the deposited films in the array were characterized by the in situ monitoring of volume expansion upon exposure to analytes using white light reflectance sspectroscopy. The swelling properties of processed films are compared to the unprocessed ones for the purpose of examining the variation induced by the processing steps (exposure and development circles). Additionally, the repeatability of the processes as well as the effect of analyte sequence is examined. This process offers good control of the lateral dimensions and the thickness of the polymeric films and allows for the parallel fabrication of sensors based on different transduction mechanisms including mass sensitive and stress induced bending chemical sensors. (c) 2007 Elsevier Ltd. All rights reserved. | en |
| heal.publisher | Elsevier | en |
| heal.journalName | European Polymer Journal | en |
| heal.journalType | peer reviewed | - |
| heal.fullTextAvailability | TRUE | - |
| Appears in Collections: | Άρθρα σε επιστημονικά περιοδικά ( Ανοικτά) | |
Files in This Item:
| File | Description | Size | Format | |
|---|---|---|---|---|
| Beltsios-2007-Sequential polymer lithography.pdf | 582.76 kB | Adobe PDF | View/Open Request a copy |
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