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https://olympias.lib.uoi.gr/jspui/handle/123456789/14332Full metadata record
| DC Field | Value | Language |
|---|---|---|
| dc.contributor.author | Beltsios, K. | en |
| dc.contributor.author | Athanasiou, E. | en |
| dc.contributor.author | Tegou, E. | en |
| dc.contributor.author | Kanellopoulos, N. | en |
| dc.date.accessioned | 2015-11-24T17:37:15Z | - |
| dc.date.available | 2015-11-24T17:37:15Z | - |
| dc.identifier.issn | 0021-8995 | - |
| dc.identifier.uri | https://olympias.lib.uoi.gr/jspui/handle/123456789/14332 | - |
| dc.rights | Default Licence | - |
| dc.subject | phase inversion | en |
| dc.subject | polymeric coatings | en |
| dc.subject | lithography | en |
| dc.subject | epoxy novolac resin | en |
| dc.subject | wet silylation | en |
| dc.subject | polymer dissolution | en |
| dc.subject | formation mechanism | en |
| dc.subject | high-resolution | en |
| dc.subject | separation | en |
| dc.subject | resists | en |
| dc.subject | wet | en |
| dc.subject | crystallization | en |
| dc.subject | photoresists | en |
| dc.subject | gelation | en |
| dc.subject | systems | en |
| dc.title | Phase-inversion applications beyond membrane formation. I. Lithography films | en |
| heal.type | journalArticle | - |
| heal.type.en | Journal article | en |
| heal.type.el | Άρθρο Περιοδικού | el |
| heal.identifier.secondary | <Go to ISI>://000089981200010 | - |
| heal.language | en | - |
| heal.access | campus | - |
| heal.recordProvider | Πανεπιστήμιο Ιωαννίνων. Σχολή Θετικών Επιστημών. Τμήμα Μηχανικών Επιστήμης Υλικών | el |
| heal.publicationDate | 2000 | - |
| heal.abstract | Polymeric films cast from a polymer solution can develop a bulk porosity, if the conditions are favorable for phase inversion (PI), a physical chemical process based on fluid-fluid demixing of which there are two known major variants: wet and dry PI. As the formation of polymeric coatings often involves a polymeric solution or gel precursor, dry or wet PI phenomena may affect the structure formation of the final solvent-free coating. In this article we identify the situations under which lithographic films can develop a PI structure and focus on solid polymer layers undergoing postcasting wet processing. Examples are provided from the wet processing of a fractionated epoxy novolac resin currently used in lithographic patterning. (C) 2000 John Wiley & Sons, Inc. | en |
| heal.publisher | John Wiley & Sons | en |
| heal.journalName | Journal of Applied Polymer Science | en |
| heal.journalType | peer reviewed | - |
| heal.fullTextAvailability | TRUE | - |
| Appears in Collections: | Άρθρα σε επιστημονικά περιοδικά ( Ανοικτά) | |
Files in This Item:
| File | Description | Size | Format | |
|---|---|---|---|---|
| Beltsios-2000-Pha.pdf | 366.6 kB | Adobe PDF | View/Open Request a copy |
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