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dc.contributor.authorPatsalas, P.en
dc.contributor.authorKaziannis, S.en
dc.contributor.authorKosmidis, C.en
dc.contributor.authorPapadimitriou, D.en
dc.contributor.authorAbadias, G.en
dc.contributor.authorEvangelakis, G. A.en
dc.date.accessioned2015-11-24T17:37:07Z-
dc.date.available2015-11-24T17:37:07Z-
dc.identifier.issn0021-8979-
dc.identifier.urihttps://olympias.lib.uoi.gr/jspui/handle/123456789/14315-
dc.rightsDefault Licence-
dc.subjectcross-sectional structureen
dc.subjectsubstrate-temperatureen
dc.subjectthin-filmsen
dc.subjecta-cen
dc.subjectdiamonden
dc.subjectablationen
dc.subjectgrowthen
dc.subjectgraphiteen
dc.subjectfractionen
dc.subjectsurfaceen
dc.titleOptimized pulsed laser deposition by wavelength and static electric field control: The case of tetrahedral amorphous carbon filmsen
heal.typejournalArticle-
heal.type.enJournal articleen
heal.type.elΆρθρο Περιοδικούel
heal.identifier.primaryDoi 10.1063/1.2745445-
heal.identifier.secondary<Go to ISI>://000247625700137-
heal.identifier.secondaryhttp://link.aip.org/getpdf/servlet/GetPDFServlet?filetype=pdf&id=JAPIAU000101000012124903000001-
heal.languageen-
heal.accesscampus-
heal.recordProviderΠανεπιστήμιο Ιωαννίνων. Σχολή Θετικών Επιστημών. Τμήμα Μηχανικών Επιστήμης Υλικώνel
heal.publicationDate2007-
heal.abstractWe report on the application of a static (dc) electric field in the plume region during the pulsed Nd doped yttrium aluminum garnet laser deposition (PLD) of tetrahedral amorphous carbon (ta-C) films in vacuum ambient (pressure=10(-4)-10(-3) Pa), where the working pressure is exclusively due to ablation vapor. This approach is strikingly different from the plasma- or ion-beam-assisted PLD because the mean free path at this pressure is by far longer than the target to substrate distance. Thus, the electric field interacts with individual ionized species invoking ion acceleration and gas-phase reactions among different ionized species. These phenomena are clearly dependent on the laser wavelength (first, second, or third harmonic, lambda=1064, 532, and 355 nm, respectively) used for the ablation. We found that the application of the electric field causes surface smoothing (the roughness decreases from about 1 to 0.4 nm) and faster deposition rate (from about 2 to 7 nm/min) for the second and third harmonics. In addition, the phenomena are less intense in the case of the first harmonic due to the low concentration of ionized species in the plume. In addition, in the case of PLD using lambda=532 nm, the electric field improves the film's density (from 2.60 to 2.95 g/cm(3)). The correlations found are discussed in terms of the ablated species and the deposition mechanisms of the ta-C. (c) 2007 American Institute of Physics.en
heal.publisherAmerican Institute of Physicsen
heal.journalNameJournal of Applied Physicsen
heal.journalTypepeer reviewed-
heal.fullTextAvailabilityTRUE-
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