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DC Field | Value | Language |
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dc.contributor.author | Gautier, S. | en |
dc.contributor.author | Komninou, P. | en |
dc.contributor.author | Patsalas, P. | en |
dc.contributor.author | Kehagias, T. | en |
dc.contributor.author | Logothetidis, S. | en |
dc.contributor.author | Dimitriadis, C. A. | en |
dc.contributor.author | Nouet, G. | en |
dc.date.accessioned | 2015-11-24T17:36:55Z | - |
dc.date.available | 2015-11-24T17:36:55Z | - |
dc.identifier.issn | 0268-1242 | - |
dc.identifier.uri | https://olympias.lib.uoi.gr/jspui/handle/123456789/14299 | - |
dc.rights | Default Licence | - |
dc.subject | n-type gan | en |
dc.subject | nitride thin-films | en |
dc.subject | resistance ohmic contacts | en |
dc.subject | si-doped gan | en |
dc.subject | titanium nitride | en |
dc.subject | gallium nitride | en |
dc.subject | thermal-stability | en |
dc.subject | hexagonal gan | en |
dc.subject | ti/al-contacts | en |
dc.subject | low-temperature | en |
dc.title | Optical and electrical properties of TiN/n-GaN contacts in correlation with their structural properties | en |
heal.type | journalArticle | - |
heal.type.en | Journal article | en |
heal.type.el | Άρθρο Περιοδικού | el |
heal.identifier.primary | Doi 10.1088/0268-1242/18/6/334 | - |
heal.identifier.secondary | <Go to ISI>://000183851500039 | - |
heal.language | en | - |
heal.access | campus | - |
heal.recordProvider | Πανεπιστήμιο Ιωαννίνων. Σχολή Θετικών Επιστημών. Τμήμα Μηχανικών Επιστήμης Υλικών | el |
heal.publicationDate | 2003 | - |
heal.abstract | The optical and electrical properties of TiN contacts on Si-doped GaN were investigated in correlation with their structural properties. Stoichiometric TiN films were directly deposited on 2.5 mum thick n-GaN by dc reactive magnetron sputtering at room temperature, while the stoichiometry and the structural characteristics of the TiN films were determined by in situ spectroscopic ellipsometry (SE). SE was also used for characterization of the GaN surface and for chemical etching of gallium oxide. Current-voltage measurements showed an ohmic behaviour for the as-deposited and annealed TiN/GaN samples. The specific contact resistivity was found to be 4.5 x 10(-3) Omega cm(2) for the as-deposited TiN film, becoming as low as 5.9 x 10(-4) Omega cm(2) after annealing at 400 degreesC. Further thermal treatment over 500 degreesC resulted in significant TiN oxidation and poor adhesion of the TiN film on the GaN, leading to an increase in specific contact resistivity. Transmission electron microscopy revealed structural and interfacial contact changes after high thermal treatment. | en |
heal.publisher | IOP Publishing Ltd | en |
heal.journalName | Semiconductor Science and Technology | en |
heal.journalType | peer reviewed | - |
heal.fullTextAvailability | TRUE | - |
Appears in Collections: | Άρθρα σε επιστημονικά περιοδικά ( Ανοικτά) |
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File | Description | Size | Format | |
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Patsalas-2003-Opt.pdf | 358.87 kB | Adobe PDF | View/Open Request a copy |
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