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DC Field | Value | Language |
---|---|---|
dc.contributor.author | Kitsara, M. | en |
dc.contributor.author | Chatzichristidi, M. | en |
dc.contributor.author | Niakoula, D. | en |
dc.contributor.author | Goustouridis, D. | en |
dc.contributor.author | Beltsios, K. | en |
dc.contributor.author | Argitis, P. | en |
dc.contributor.author | Raptis, I. | en |
dc.date.accessioned | 2015-11-24T17:35:20Z | - |
dc.date.available | 2015-11-24T17:35:20Z | - |
dc.identifier.issn | 0167-9317 | - |
dc.identifier.uri | https://olympias.lib.uoi.gr/jspui/handle/123456789/14113 | - |
dc.rights | Default Licence | - |
dc.subject | embedded microchannels | en |
dc.subject | epoxy resist | en |
dc.subject | uv lithography | en |
dc.subject | micro-channels | en |
dc.subject | fabrication | en |
dc.title | Layer-by-layer UV micromachining methodology of epoxy resist embedded microchannels | en |
heal.type | journalArticle | - |
heal.type.en | Journal article | en |
heal.type.el | Άρθρο Περιοδικού | el |
heal.identifier.primary | DOI 10.1016/j.mee.2006.01.157 | - |
heal.identifier.secondary | <Go to ISI>://000237581900162 | - |
heal.identifier.secondary | http://ac.els-cdn.com/S0167931706001031/1-s2.0-S0167931706001031-main.pdf?_tid=29a5a8629e67ef735b7acbfc9ca2885c&acdnat=1339662561_8f52e068d74242340a2dd4a3162b2916 | - |
heal.language | en | - |
heal.access | campus | - |
heal.recordProvider | Πανεπιστήμιο Ιωαννίνων. Σχολή Θετικών Επιστημών. Τμήμα Μηχανικών Επιστήμης Υλικών | el |
heal.publicationDate | 2006 | - |
heal.abstract | A novel layer-by-layer fabrication approach for the manufacturing of long embedded microchannels is presented. The methodology is based on the use of two epoxy based photoresist layers with different photo acid generator (PAG) concentration. Using this methodology long, functional microchannels are demonstrated. The technology has been optimized through tuning of the epoxy molecular weight, PAG concentrations and processing conditions. Finally, a basic microfluidic application is presented. (c) 2006 Elsevier B.V. All rights reserved. | en |
heal.publisher | Elsevier | en |
heal.journalName | Microelectronic Engineering | en |
heal.journalType | peer reviewed | - |
heal.fullTextAvailability | TRUE | - |
Appears in Collections: | Άρθρα σε επιστημονικά περιοδικά ( Ανοικτά) |
Files in This Item:
File | Description | Size | Format | |
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Beltsios-2006-Layer-by-layer UV.pdf | 327.56 kB | Adobe PDF | View/Open Request a copy |
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