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dc.contributor.authorJensen, K. F.en
dc.contributor.authorFotiadis, D. I.en
dc.contributor.authorEinset, E. O.en
dc.contributor.authorMountziaria, T. J.en
dc.date.accessioned2015-11-24T17:32:32Z-
dc.date.available2015-11-24T17:32:32Z-
dc.identifier.issn0065-7727-
dc.identifier.urihttps://olympias.lib.uoi.gr/jspui/handle/123456789/13744-
dc.rightsDefault Licence-
dc.titleChemical-Reactions and Transport Processes Underlying Organometallic Chemical Vapor-Deposition of Compound Semiconductorsen
heal.typejournalArticle-
heal.type.enJournal articleen
heal.type.elΆρθρο Περιοδικούel
heal.identifier.secondary<Go to ISI>://A1990DU04201294-
heal.languageen-
heal.accesscampus-
heal.recordProviderΠανεπιστήμιο Ιωαννίνων. Σχολή Θετικών Επιστημών. Τμήμα Μηχανικών Επιστήμης Υλικώνel
heal.publicationDate1990-
heal.publisherAmerican Chemical Societyen
heal.journalNameAbstracts of Papers of the American Chemical Societyen
heal.journalTypepeer reviewed-
heal.fullTextAvailabilityTRUE-
Appears in Collections:Άρθρα σε επιστημονικά περιοδικά ( Ανοικτά)

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