Please use this identifier to cite or link to this item:
https://olympias.lib.uoi.gr/jspui/handle/123456789/13603| Title: | Thickness-dependent glass transition temperature of thin resist films for high resolution lithography |
| Institution and School/Department of submitter: | Πανεπιστήμιο Ιωαννίνων. Σχολή Θετικών Επιστημών. Τμήμα Μηχανικών Επιστήμης Υλικών |
| Keywords: | resist,lithography,thin films,interferometry,ellipsometry,ultrathin polymer-films |
| URI: | https://olympias.lib.uoi.gr/jspui/handle/123456789/13603 |
| ISSN: | 0167-9317 |
| Link: | <Go to ISI>://000237581900106 http://ac.els-cdn.com/S0167931706002619/1-s2.0-S0167931706002619-main.pdf?_tid=a451592539bc425b8d19bc9033110612&acdnat=1339662570_ad10d5d2e9bb98497784d192ad011652 |
| Publisher: | Elsevier |
| Appears in Collections: | Άρθρα σε επιστημονικά περιοδικά ( Ανοικτά) |
Files in This Item:
| File | Description | Size | Format | |
|---|---|---|---|---|
| Beltsios-2006-Thickness-dependent glass.pdf | 496.81 kB | Adobe PDF | View/Open Request a copy |
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