Browsing by Author Gogolides, E.

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Thermal and mechanical analysis of photoresist and silylated photoresist films: Application to AZ 5214(TM)Gogolides, E.; Tegou, E.; Beltsios, K.; Papadokostaki, K.; Hatzakis, M.24-Nov-2015-
Thickness-dependent glass transition temperature of thin resist films for high resolution lithographyMarceau, S.; Tortai, J. H.; Tillier, J.; Vourdas, N.; Gogolides, E.; Raptis, I.; Beltsios, K.; van Werden, K.24-Nov-2015-