Please use this identifier to cite or link to this item:
https://olympias.lib.uoi.gr/jspui/handle/123456789/13544| Title: | The effect of substrate temperature and biasing on the mechanical properties and structure of sputtered titanium nitride thin films |
| Institution and School/Department of submitter: | Πανεπιστήμιο Ιωαννίνων. Σχολή Θετικών Επιστημών. Τμήμα Μηχανικών Επιστήμης Υλικών |
| Keywords: | grain growth,nano-indentation,sputtering,titanium nitride,x-ray diffraction,tin,contacts,zrn,hfn |
| URI: | https://olympias.lib.uoi.gr/jspui/handle/123456789/13544 |
| ISSN: | 0257-8972 |
| Link: | <Go to ISI>://000085945600061 |
| Publisher: | Elsevier |
| Appears in Collections: | Άρθρα σε επιστημονικά περιοδικά ( Ανοικτά) |
Files in This Item:
| File | Description | Size | Format | |
|---|---|---|---|---|
| Patsalas-2000-The effect of substrate temperature.pdf | 178.81 kB | Adobe PDF | View/Open Request a copy |
This item is licensed under a Creative Commons License
