Please use this identifier to cite or link to this item:
https://olympias.lib.uoi.gr/jspui/handle/123456789/13544Full metadata record
| DC Field | Value | Language |
|---|---|---|
| dc.contributor.author | Patsalas, P. | en |
| dc.contributor.author | Charitidis, C. | en |
| dc.contributor.author | Logothetidis, S. | en |
| dc.date.accessioned | 2015-11-24T17:31:04Z | - |
| dc.date.available | 2015-11-24T17:31:04Z | - |
| dc.identifier.issn | 0257-8972 | - |
| dc.identifier.uri | https://olympias.lib.uoi.gr/jspui/handle/123456789/13544 | - |
| dc.rights | Default Licence | - |
| dc.subject | grain growth | en |
| dc.subject | nano-indentation | en |
| dc.subject | sputtering | en |
| dc.subject | titanium nitride | en |
| dc.subject | x-ray diffraction | en |
| dc.subject | tin | en |
| dc.subject | contacts | en |
| dc.subject | zrn | en |
| dc.subject | hfn | en |
| dc.title | The effect of substrate temperature and biasing on the mechanical properties and structure of sputtered titanium nitride thin films | en |
| heal.type | journalArticle | - |
| heal.type.en | Journal article | en |
| heal.type.el | Άρθρο Περιοδικού | el |
| heal.identifier.primary | Doi 10.1016/S0257-8972(99)00606-4 | - |
| heal.identifier.secondary | <Go to ISI>://000085945600061 | - |
| heal.language | en | - |
| heal.access | campus | - |
| heal.recordProvider | Πανεπιστήμιο Ιωαννίνων. Σχολή Θετικών Επιστημών. Τμήμα Μηχανικών Επιστήμης Υλικών | el |
| heal.publicationDate | 2000 | - |
| heal.abstract | The mechanical properties of titanium nitride (TiNx) thin films have been investigated using depth sensing nanoindentation tests. The effects of substrate temperature (T-s) and of substrate biasing (V-b) on the mechanical properties and the microstructure of the TiNx films were studied. T-s and V-b have strong effect on the film's microstructural characteristics such as density, grain size and orientation. It was found that deposition at high T-s and V-b promotes the growth of (002) oriented films with density close to the bulk density of stoichiometric TIN, indicating the absence of voids and the growth of stoichiometric TiN. The film hardness and elastic modulus were measured using the continuous stiffness measurements technique. It was found that there exists a direct correlation between the film's mechanical properties and microstructure. The films that exhibit the best mechanical performance are those grown along the (002) orientation and being denser and stoichiometric. (C) 2000 Elsevier Science S.A. All rights reserved. | en |
| heal.publisher | Elsevier | en |
| heal.journalName | Surface & Coatings Technology | en |
| heal.journalType | peer reviewed | - |
| heal.fullTextAvailability | TRUE | - |
| Appears in Collections: | Άρθρα σε επιστημονικά περιοδικά ( Ανοικτά) | |
Files in This Item:
| File | Description | Size | Format | |
|---|---|---|---|---|
| Patsalas-2000-The effect of substrate temperature.pdf | 178.81 kB | Adobe PDF | View/Open Request a copy |
This item is licensed under a Creative Commons License
